Epitaxial Technology Center

Customer
Email

Wafer Size  
Number of wafers
Type of Substrate
Off-orientation
Substrates supplied by Customer

Epi Face
Polytype

Number of layers Thickness (µm) Doping (cm-3)
  Min Max Min Max Type (n/p)
Buffer Layer
(std: n-type - 0.5 µm - 1x1018 cm-3)
     
First Epi Layer
Second Epi Layer
Third Epi Layer
Fourth Epi Layer
Uniformities (only if there is one layer)

Total defects cm-2
Surface Roughness (10x10µm) Rq nm
Growth rate (If requested) µm/h

Delivery Date (dd/mm/yyyy)
Address
Attention to
NOTES
Attachments (only .pdf - max 2MB)